One Domain, Four Schemas
TL;DR for operators Scientific-literature extraction is not only a question of whether an AI system can find the right facts. It also needs a representation capable of preserving the distinctions engineers will later use. Sadruddin et al. build four separate machine-validatable process schemas for atomic layer deposition (ALD) and atomic layer etching (ALE), divided again between experiments and simulations.1 The split is consequential: the schemas contain between 167 and 275 properties, while required-property counts range from just 3 in ALD simulation to 56 in ALE simulation. ...